Passivation of Crystalline Silicon Wafers by Ultrathin Oxide Layers: Comparison of Wet-chemical, Plasma and Thermal Oxidation Techniques
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Angermann, Heike; Stegemann, Bert; Balamou, Patrice; Lussky, Thomas; Gad, Karim M.; Vössing, Daniel; Kasemann, Martin: Passivation of Crystalline Silicon Wafers by Ultrathin Oxide Layers: Comparison of Wet-chemical, Plasma and Thermal Oxidation Techniques. In: Proceedings 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC). Hg. von IEEE. Waikoloa Village: 2018, S. 2779-2782.
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Passivation of Crystalline Silicon Wafers by Ultrathin Oxide Layers: Comparison of Wet-chemical, Plasma and Thermal Oxidation Techniques
2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC)
Waikoloa Village, 10.06.2018Veranstaltungsbeitrag › Vortrag › 2018