On the Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Microcrystalline Silicon Oxides

Artikel › Journalartikel › 2015

Zitation

Gabriel, Onno; Kirner, Simon; Klingsporn, Max; Friedrich, Felice; Stannowski, Bernd; Schlatmann, Rutger: On the Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Microcrystalline Silicon Oxides. In: Plasma Processes and Polymers Volume 12, Issue 1. (2015), S. 82-91.

ISSN

1612-8869

Link

http://dx.doi.org/10.1002/ppap.201400114

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