Optimization of PECVD process for ultra-thin tunnel SiOx film as passivation layer for silicon heterojunction solar cells

Konferenzbeitrag › Konferenzpaper › 2016

Zitation

Mazzarella, Luana; Kolb, Sophie; Kirner, Simon; Calnan, Sonya; Korte, Lars; Stannowski, Bernd; Rech, Bernd; Schlatmann, Rutger: Optimization of PECVD process for ultra-thin tunnel SiOx film as passivation layer for silicon heterojunction solar cells. In: Photovoltaic Specialists Conference (PVSC), 2016 IEEE 43rd. Hg. von IEEE. Portland: 2016, S. 2955-2959.

ISBN

978-1-5090-2725-5 (print), 978-1-5090-2724-8 (online)

Link

http://dx.doi.org/10.1109/PVSC.2016.7750202

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