Interface state densities and recombination losses at silicon / silicon oxide interfaces prepared by wet-chemical treatment and UHV plasma oxidation

Veranstaltungsbeitrag › Posterpräsentation › 2009

Veranstaltung

Spring-Meeting of European Materials Research Society (EMRS09), Symposium H: Synthesis, processing and characterization of nanoscale multi functional oxide films
Strasbourg; France , 08.06.2009 - 12.06.2009

Ergänzende Angaben

Poster H. Angermann, B. Stegemann, J. Rappich, A. Schöpke, C. Klimm

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