Near-UV photoelectron spectroscopy as a tool for defect characterization in a-Si:H and at silicon interfaces

Veranstaltungsbeitrag › Posterpräsentation › 2009

Veranstaltung

First International Workshop on the Staebler-Wronski Effect (1st IWSWE)
Berlin, 19.04.2009 - 22.04.2009

Ergänzende Angaben

Poster L. Korte, M. Schmidt, B. Stegemann

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