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Structure and photoelectrical properties of SiO2/Si/SiO2 quantum wells prepared under ultrahigh vacuum conditions

Artikel › Journalartikel › 2008

Zitation

Stegemann, Bert; Schoepke, Andreas; Schmidt, Manfred: Structure and photoelectrical properties of SiO2/Si/SiO2 quantum wells prepared under ultrahigh vacuum conditions. In: Journal of Non-Crystalline Solids 354, 19-25. (2008), S. 2100–2104.

ISSN

0022-3093

Link

http://dx.doi.org/10.1016/j.jnoncrysol.2007.10.035

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