Effect of wet-chemical substrate smoothing on passivation of ultrathin-SiO2/n-Si(111) interfaces prepared with atomic oxygen at thermal impact energies

Typ

Beitrag Zeitschrift von Prof. Dr. Bert Stegemann

Zitation

Angermann, Heike ; Gref, Orman ; Stegemann, Bert : Effect of wet-chemical substrate smoothing on passivation of ultrathin-SiO2/n-Si(111) interfaces prepared with atomic oxygen at thermal impact energies. In: Central European Journal of Physics, S. 1472-1481, 2011, ISSN 1895-1082 (print version), 1644-3608 (electronic version)

Homepage

http://dx.doi.org/10.2478/s11534-011-0053-0