Predictive Evaluation of Atomic Layer Deposition Characteristics for Deposition of Al2O3 thin films
Begutachtung Journal / Publikation › 2023
SHENDOKAR, S.M.; Hossen, M.; Nalawade, S.; Mantrip-r-agada, S.; Aravamudhan, S. Predictive Evaluation of Atomic Layer Deposition Characteristics for Deposition of Al2O3 thin films, in Proceedings of the 2nd International Electronic Conference on Processes, 17–31 May 2023, MDPI: Basel, Switzerland, doi:10.3390/ECP2023-14631
https://ecp2023.sciforum.net/#session2652
03.04.2023