Circular Ion Sources for Plasma Enhanced Atomic Layer Deposition Applications

Typ

Beitrag Konferenzband von Prof. Dr.-Ing. Ha Duong Ngo

Zitation

Ngo, Ha Duong; Bellido-Gonzalez, Victor; Monaghan, D.; Daniel, B.; Li, H.; Papa, F.; Kroehnert, K.; Ehrmann, Oswin; Lang, Klaus-Dieter; Mackowiak, Piotr: Circular Ion Sources for Plasma Enhanced Atomic Layer Deposition Applications. In: 58th Annual Technical Conference Proceedings, S. 1040-1051, Santa Clara, 2015, ISSN 0737-5921