The influence of substrate pre-treatment on the electronic properties of the Si/SiO2 interface of ultra-thin plasma-oxides

Konferenzbeitrag › Konferenzpaper › 2010

Zitation

Malguth, Enno; Gref, Orman; Schöpke, Andreas; Stegemann, Bert; Schmidt, Manfred; Angermann, Heike: The influence of substrate pre-treatment on the electronic properties of the Si/SiO2 interface of ultra-thin plasma-oxides. In: Proc. of International Conference Solid State Surfaces and Interfaces VII (SSSI-VII). Smolenice, Slovakia: 2010, S. pp. 49-50.

ISBN

978-80-223-2938-5

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