A model of the passivation of ultrathin SiO2 layer / Si substrate interfaces by atomic hydrogen from a thermalised plasma source
Veranstaltungsbeitrag › Posterpräsentation › 2009
Veranstaltung
Strassbourg, France, 08.06.2009 - 12.06.2009
Spring-Meeting of European Materials Research Society (EMRS09), Symposium H: Synthesis, processing and characterization of nanoscale multi functional oxide films
Strassbourg, France, 08.06.2009 - 12.06.2009
Poster A. Sarikov, B. Stegemann, M. Schmidt