Passivation of Crystalline Silicon Wafers by Ultrathin Oxide Layers: Comparison of Wet-chemical, Plasma and Thermal Oxidation Techniques

Typ

Beitrag Konferenzband von Prof. Dr. Bert Stegemann

Zitation

Stegemann, Bert; Balamou, Patrice; Lussky, Thomas; Gad, Karim M.; Vössing, Daniel; Kasemann, Martin; Angermann, Heike: Passivation of Crystalline Silicon Wafers by Ultrathin Oxide Layers: Comparison of Wet-chemical, Plasma and Thermal Oxidation Techniques. In: Proceedings 2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC), S. 2779-2782, Waikoloa Village, 2018, ISSN 0160-8371

Homepage

10.1109/PVSC.2018.8548154